Big CONGRATULATIONS! to Dr.Samutr Assavachin, Surat Prempluem, Dr.Somlak Ittisanronnachai, Sukritta Janprakhon, and Assoc. Prof. Dr. Montree Sawangphruk*

Big CONGRATULATIONS! to
Dr.Samutr Assavachin,
Surat Prempluem,
Dr.Somlak Ittisanronnachai,
Sukritta Janprakhon,
and Assoc. Prof. Dr. Montree Sawangphruk*
Their paper, “Influence of atomic layer deposition on nickel hydroxide phase transitions in nickel foam,” has been published in Electrochemistry Communications.
Impact Factor 4.2,
Cite Score 7.9,
H-index 219.
Read here: https://doi.org/10.1016/j.elecom.2025.108091
Key Findings
• Al₂O₃ ALD accelerates NiOOH → α-Ni(OH)₂ transition, causing a +90 mV positive shift
• Bare Ni foam (NF) shows a moderate +80 mV shift over 100 cycles
• V₂O₅ ALD stabilizes the surface → no peak shift
• Peak shifts disappear at high scan rates → kinetically controlled behavior
• In situ XRD:
– Early α-Ni(OH)₂ formation in NF-A
– Gradual formation in NF
– Stable and unchanged lattice in NF-V
• Charge-transfer resistance (Rct):
– NF-A lowest (4.7 Ω) → fastest kinetics
– NF-V highest → slow cathodic reaction
Impact
Atomic layer deposition (ALD) can tune surface kinetics and phase transitions of nickel electrodes—useful for batteries, catalysis, and alkaline electrochemical devices.
#ESEVISTEC #CESTVISTEC #VISTEC #ALD #Electrochemistry #NickelFoam